Fabrication of versatile nanoporous templates with high aspect ratios by incorporation of Si-containing block copolymer into the lithographic bilayer system

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We report a new approach to fabricate versatile nanoporous templates with high aspect ratios by incorporating silicon-containing block copolymers into the lithographic bilayer system. This approach used a top thin film of self-assembled asymmetric polystyrene-block-poly(4-(tert-butyldimethylsilyl) oxystyrene) (PS-b-PSSi) as a hard etch mask and an underlying thick film of a negative-tone photoresist (SU-8) for pattern transfer. The assembly of PS-b-PSSi was well-controlled by solvent annealing on the SU-8 and deep nanopores were formed in the underlying layer by oxygen reactive ion etching due to high etch contrast. As a result, highly dense and uniform nanoporous templates with high aspect ratios were obtained over a large area. These templates have versatilities to easily control the sizes of nanopores and to make on the diverse functional substrates. Moreover, the dry-etch process during removal of nanotemplates prevented collapse and aggregation of nanostructures. As a demonstration, we fabricated vertically ordered freestanding gold nanorod arrays by using these templates. (C) 2012 Elsevier Ltd. All rights reserved.
Publisher
ELSEVIER SCI LTD
Issue Date
2012-05
Language
English
Article Type
Article
Keywords

FREESTANDING NANOROD ARRAYS; SOLAR-CELLS; TITANIA NANOTUBES; NANOWIRE ARRAYS; THIN-FILMS; SURFACE; ALUMINA

Citation

POLYMER, v.53, no.11, pp.2283 - 2289

ISSN
0032-3861
DOI
10.1016/j.polymer.2012.03.006
URI
http://hdl.handle.net/10203/103191
Appears in Collection
CH-Journal Papers(저널논문)
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