Graded Layer Modification for High Efficiency Hydrogenated Amorphous Silicon-Germanium Solar Cells

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dc.contributor.authorChung, Jin-Wonko
dc.contributor.authorPark, Jun-Woongko
dc.contributor.authorLee, Yu-Jinko
dc.contributor.authorAhn, Seh-Wonko
dc.contributor.authorLee, Heon-Minko
dc.contributor.authorPark, O-Okko
dc.date.accessioned2013-03-12T18:03:41Z-
dc.date.available2013-03-12T18:03:41Z-
dc.date.created2012-12-10-
dc.date.created2012-12-10-
dc.date.issued2012-10-
dc.identifier.citationJAPANESE JOURNAL OF APPLIED PHYSICS, v.51, no.10-
dc.identifier.issn0021-4922-
dc.identifier.urihttp://hdl.handle.net/10203/103090-
dc.description.abstractHydrogenated amorphous silicon-germanium (a-SiGe:H) solar cells are fabricated with different thicknesses of the i/n graded layer and profiling shapes for appropriate band gap profiling. Comparison of the solar parameters between the U-shape profiling and the exponential shape (E-shape) profiling has been carried out at the same total thickness. In the U-shape profiling, as the thickness of the i/n graded layer increase, the fill factor (FF) and open circuit voltage (V-oc) of p-i-n single-junction a-SiGe:H solar cells increase, but the short circuit current (J(sc)) of cells decreases. In the E-shape profiling, the J(sc) of the a-SiGe:H cell is enhanced without significant losses in V-oc. For further analysis, a modified E-shape profiling is incorporated in a-Si:H/a-SiGe:H double-junction cells, which has resulted in the improvement of V-oc and FF of double-junction cells to 1.67 V and 0.753, respectively, without significant reduction in J(sc, SiGe)(QE), 12.58 mA/cm(2). (C) 2012 The Japan Society of Applied Physics-
dc.languageEnglish-
dc.publisherJAPAN SOC APPLIED PHYSICS-
dc.subjectOPTIMIZATION-
dc.titleGraded Layer Modification for High Efficiency Hydrogenated Amorphous Silicon-Germanium Solar Cells-
dc.typeArticle-
dc.identifier.wosid000310707800034-
dc.identifier.scopusid2-s2.0-84869130080-
dc.type.rimsART-
dc.citation.volume51-
dc.citation.issue10-
dc.citation.publicationnameJAPANESE JOURNAL OF APPLIED PHYSICS-
dc.identifier.doi10.1143/JJAP.51.10NB16-
dc.embargo.liftdate9999-12-31-
dc.embargo.terms9999-12-31-
dc.contributor.localauthorPark, O-Ok-
dc.contributor.nonIdAuthorPark, Jun-Woong-
dc.contributor.nonIdAuthorLee, Yu-Jin-
dc.contributor.nonIdAuthorAhn, Seh-Won-
dc.contributor.nonIdAuthorLee, Heon-Min-
dc.type.journalArticleArticle-
dc.subject.keywordPlusOPTIMIZATION-
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