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Kinetic Modeling of Film Growth Rate in Atomic Layer Deposition Lim, J.; Park, H.; Sang-Won Kang, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.148, no.6, pp.C403 - C408, 2001-06 |
MOCVD of Titanium Nitride from a New Precursor Ti[N(CH3)C2H5]4 Shin, HK; Shin, HJ; Lee, JG; Kang, SW; Ahn, Byung Tae, CHEMISTRY OF MATERIALS, v.9, no.1, pp.76 - 80, 1997-01 |
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