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Polar Metal Phase Induced by Oxygen Octahedral Network Relaxation in Oxide Thin Films Roh, Chang Jae; Jung, Myung-Chul; Kim, Jeong Rae; Go, Kyoung-June; Kim, Jinkwon; Oh, Ho Jun; Jo, Yong-Ryun; et al, SMALL, v.16, pp.2003055, 2020-09 |
The origin of intrinsic stress and its relaxation for SiOF thin films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition Kim, SP; Choi, Si-Kyung, THIN SOLID FILMS, v.379, no.1-2, pp.259 - 264, 2000-12 |
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