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Evaluation of double spacer local oxidation of silicon (LOCOS) isolation process for sub-quarter micron design rule

Jang, SA; Kim, YB; Cho, Byung Jinresearcher; Kim, JC, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.36, no.3B, pp.1433 - 1438, 1997-03

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