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(A) Study on the stabilization of low dielectric SiOF thin film deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition = ECRPECVD 법으로 증착한 저유전율 SiOF 박막의 안정화에 관한 연구link Kim, Suk-Pil; 김석필; et al, 한국과학기술원, 2002 |
Low dielectric constant CF/SiOF composite film deposition in a helicon plasma reactor Yun, SM; Chang, Hong-Young; Kang, MS; Choi, CK, THIN SOLID FILMS, v.341, no.1-2, pp.109 - 111, 1999-03 |
Thermally Stable Siloxane Hybrid Matrix with Low Dielectric Loss for Copper-Clad Laminates for High-Frequency Applications Kim, Yongho; Lim, Young Woo; Kim, Yun Hyeok; Bae, Byeong-Soo, ACS APPLIED MATERIALS & INTERFACES, v.8, no.13, pp.8335 - 8340, 2016-04 |
Water absorption characteristics of fluorinated silicon oxide films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition using SiH4, SiF4 and O-2 Byun, KM; Lee, Won-Jong, THIN SOLID FILMS, v.376, no.1-2, pp.26 - 31, 2000-11 |
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