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Effect of acid structure on deprotection of poly(2-trimethylsilyl-2-propyl methacrylate) Kim, Jin-Baek; Kim, H, POLYMER, v.40, no.14, pp.4055 - 4061, 1999-06 |
Synthesis of poly(2-trimethylsilyl-2-propyl methacrylate) and their application as a dry-developable chemically amplified photoresist Kim, Jin-Baek; Kim, H; Choi, JH, POLYMER, v.40, no.6, pp.1617 - 1621, 1999-03 |
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