Browse by Subject WF6

Showing results 1 to 2 of 2

1
EFFECTS OF DEPOSITION RATE ON THE ENCROACHMENT IN TUNGSTEN FILMS REDUCED BY H-2

PARK, YW; KIM, IL; Park, Chong-Ookresearcher; Chun , Soung Soonresearcher, JOURNAL OF MATERIALS SCIENCE, v.26, no.19, pp.5318 - 5322, 1991-10

2
Fluorine Effects Originating from the CVD W Process on Charge-Trap Flash Memory Cells

Moon, Jung Min; Lee, Tae Yoon; Ahn, Hyunjun; Lee, Tae In; Hwang, Wan Sik; Cho, Byung-Jinresearcher, IEEE TRANSACTIONS ON ELECTRON DEVICES, v.66, no.1, pp.378 - 382, 2019-01

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