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Molecular simulation study on adhesions and deformations for Polymethyl Methacrylate (PMMA) resist in nanoimprint lithography

Kwon, Sungjin; Lee, Youngmin; Park, Jaeshin; Im, Seyoungresearcher, JOURNAL OF MECHANICAL SCIENCE AND TECHNOLOGY, v.25, no.9, pp.2311 - 2322, 2011-09

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