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A study on the crystallographic orientation with residual stress and electrical property of Al films deposited by sputtering Kim, SP; Choi, HM; Choi, Si-Kyung, THIN SOLID FILMS, v.322, no.1-2, pp.298 - 302, 1998-06 |
Growth of AlN films using hydrazidoalane single-source precursors Kim, Y; Kim, JH; Park, JE; Bae, BJ; Kim, Bongsoo; Park, Joon Taik; Yu, KS; et al, THIN SOLID FILMS, v.339, no.1-2, pp.200 - 202, 1999-02 |
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