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Silicon epitaxial film growth on silicon substrate exposed to UV-excited NF3/H-2 gas for native oxide removal Kwon, SK; Kim, DoHyun; Baek, JT, JOURNAL OF CRYSTAL GROWTH, v.198, no.2, pp.1039 - 1044, 1999-03 |
The polymeric upper bound for N-2/NF3 separation and beyond; ZIF-8 containing mixed matrix membranes Park, Sunghwan; Kang, Woo Ram; Kwon, Hyuk Taek; Kim, Soobin; Seo, Myung-Eun; Bang, Joona; Lee, Sang Hyup; et al, JOURNAL OF MEMBRANE SCIENCE, v.486, pp.29 - 39, 2015-07 |
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