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Svnthesis and micropatterning properties of a novel base-soluble, positive-working, photosensitive polyirnide having an o-nitrobenzyl ether group

Shin, GJ; Jung, JC; Chi, JH; Oh, TH; Kim, Jin-Baekresearcher, JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, v.45, no.5, pp.776 - 788, 2007-03

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