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EFFECTS OF DEPOSITION RATE ON THE ENCROACHMENT IN TUNGSTEN FILMS REDUCED BY H-2 PARK, YW; KIM, IL; Park, Chong-Ook; Chun , Soung Soon, JOURNAL OF MATERIALS SCIENCE, v.26, no.19, pp.5318 - 5322, 1991-10 |
Fluorine Effects Originating from the CVD W Process on Charge-Trap Flash Memory Cells Moon, Jung Min; Lee, Tae Yoon; Ahn, Hyunjun; Lee, Tae In; Hwang, Wan Sik; Cho, Byung-Jin, IEEE TRANSACTIONS ON ELECTRON DEVICES, v.66, no.1, pp.378 - 382, 2019-01 |
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