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Chemical effect of dry and wet cleaning of the Ru protective layer of the extreme ultraviolet lithography reflector Belau, L; Park, JeongYoung; Liang, T; Seo, H; Somorjai, GA, JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.27, no.4, pp.1919 - 1925, 2009-07 |
Rotationally resolved spectroscopy of the A approximate to (2)A(1)<- X approximate to (2)B(1) transition of H(2)S(+) above the barrier to linearity using the mass-analyzed threshold ionization photofragment excitation technique Han, Song-Hee; Kang, Tae-Yeon; Kim, Sang-Kyu, JOURNAL OF CHEMICAL PHYSICS, v.132, no.12, 2010-03 |
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