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Atomic scale simulation of physical sputtering of silicon oxide and silicon nitride thin films Kim, DH; Lee, GH; Lee, SY; Kim, DoHyun, JOURNAL OF CRYSTAL GROWTH, v.286, no.1, pp.71 - 77, 2006-01 |
Plasma sputtering of silicon dioxide substrate by low energy Ar ion bombardment: molecular dynamics simulation Kim, DH; Lee, SY; Kim, DoHyun, JOURNAL OF CRYSTAL GROWTH, v.237, pp.217 - 222, 2002-04 |
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